The new Ultra Clean Water Filtration Skid features the latest technology for ultrapure water cleanliness,
using a newly developed ultrafiltration (UF) membrane that is dual-rated at 2 nm and 4 kD.
UF is the state
of the art final filtration step prior to the final utilization of ultrapure water in semiconductor manufacturing.
It is used to remove traces of
- Nanoparticles
- Macromolecules
- Colloidal silicates
Hollow fiber membranes bundled in UF module housings divide the incoming ultrapure water into ultra clean permeate
and contamination containing reject. Controlled back-diffusion of accumulated particles prevents contamination of
the membrane. The reject—typically 5% of the permeate flow—discharges the collected contaminations from the UF modules.
The reject flow will be cleaned up in a polisher.
The Ultra Clean Water Filtration Skid is used for today’s most
demanding ultra-high purity water systems in sub fab level or at the point of use.
A Key
for UPW Supply in the Semiconductor Industry
Up to four UF modules are combined in a closed
micro environment. They facilitate up to 50 m³/h permeate flow. Skids can be combined to provide higher
flow capacity.
A purge flow of filtered clean dry air (CDA) prior to and during maintenance creates a
clean environment surrounding the UF modules and reduces contamination of interfaces and piping /module connections.
Water reject is treated by a polishing unit that increases recovery rate up to 100%.
Designed to Meet the Highest
Demands
- Superior retention of nanoparticles, macro-molecular contamination and colloidal silicates
- Up
to 100 % recovery rate
- Uses high performance Pall Microza UF modules
- Preventive maintenance based on
in situ module integrity tests using Palltronic® analyzers
- Compact “all in one” cabinet provides smallest
footprint
- PVDF HP piping for highest purity
- Air purging facilitates module exchange and maintenance
operations under micro environment
- Recording, visualization and digital monitoring of pressure signals by an
electronic data manager enables easy system integration
- “Plug &
play” approach minimizes time and cost for installation and commissioning
- Seismic brackets
A Key Tool for UPW Supply in the Semiconductor Industry
Up to four UF modules are combined in a closed micro environment. They facilitate up to 50 m³/h permeate flow. Skids can be combined to provide higher flow capacity.
A purge flow of filtered clean dry air (CDA) prior to and during maintenance creates a clean environment surrounding the UF modules and reduces contamination of interfaces and piping /module connections. Water reject is treated
by a polishing unit that increases recovery rate up to 100%.
Designed to Meet the Highest Demands
- Superior retention of nanoparticles, macro-molecular contamination and colloidal silicates
- Up to 100 % recovery rate
- Uses high performance Pall Microza UF modules
- Preventive maintenance based on in situ module integrity tests using Palltronic® analyzers
- Compact “all in one” cabinet provides smallest footprint
- PVDF HP piping for highest purity
- Air purging facilitates module exchange and maintenance operations under micro environment
- Recording, visualization and digital monitoring of pressure signals by an electronic data manager enables easy system integration
- “Plug & play” approach minimizes time and cost for installation and commissioning
- Seismic brackets